Aspergillus ochraceus Wilhelm, anamorph 拉丁名
ATCC 18500 編號
Product category Fungi
Strain designation 別名 NRRL 405 [4718]
Type strain 模式菌株 No
Isolation 分離基物 source Rubber sheet
Applications Organic acid production
Product format 提供形式 Freeze-dried
Specific applications hydroxylates 11,13-dehydrosantonin oxidizes chrysanthemol produces 11-alpha-hydroxyprogesterone produces L-malic acid produces Reichstein's compound S produces succinic acid transforms flavonoids oxidizes chrysanthemols to chrysanthemic acids transformation of: sesquiterpene lactone costunolide
Preceptrol No
Technical information ATCC Technical Services does not have technical information on patent deposits that are not produced or characterized by ATCC.
Additional information can be found in the corresponding patent available from the patent holder or with the U.S. and/or international patent office.
Medium 培養(yǎng)基 ATCC Medium 312: Czapek's agar
Temperature 培養(yǎng)溫度 24°C
Handling procedure 1. Open vial according to enclosed instructions.
2. From a single test tube of sterile distilled water (5 to 6 ml), withdraw approximately 0.5 to 1.0 ml with a sterile pipette and apply directly to the pellet. Stir to form a suspension.
3. Aseptically transfer the suspension back into the test tube of sterile distilled water.
4. Let the test tube sit at room temperature (25°C) undisturbed for at least 2 hours; overnight rehydration is recommended.
5. Mix the suspension well. Use several drops to inoculate recommended solid or liquid medium.
6. Incubate cultures at recommended temperature.
Deposited as Aspergillus ochraceus Wilhelm, anamorph Depositors NRRL
Chain of custody ATCC <-- NRRL <-- C. Thom 4718 Patent depository This material was deposited with the ATCC Patent Depository to fulfill U.S. or international patent requirements.
This material may not have been produced or characterized by ATCC.
As an International Depository Authority (IDA) for patent deposits, ATCC is required to complete viability testing only at time of initial deposit of patent material. Patent deposits are made available on behalf of the Depositor when the pertinent U.S. or international patent is issued, but material may not be used to infringe the patent claims.